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SPECIAL SECTION TECHNICAL PAPERS

A New Approach to Calculate Atomic Flux Divergence by Electromigration

[+] Author and Article Information
K. Sasagawa, N. Nakamura, M. Saka

Department of Mechanical Engineering, Tohoku University, Aoba01, Aramaki, Aoba-ku, Sendai 980-8579, Japan

H. Abé

Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

J. Electron. Packag 120(4), 360-366 (Dec 01, 1998) (7 pages) doi:10.1115/1.2792647 History: Received January 19, 1998; Revised July 28, 1998; Online November 06, 2007

Abstract

In this paper, a new calculation method of the atomic flux divergence used to predict the formation of electromigration-induced void is proposed by considering two-dimensional distributions of current density and temperature and also simply considering the line structure of not only polycrystalline, but also bamboo line. For the verification, electromigration phenomenon near the corner of an angled polycrystalline line, which results in two-dimensional distributions of current density and temperature, is treated as an example. The usefulness of the proposed method is discussed in the light of the comparison of prediction of void formation near the corner with the experimental result.

Copyright © 1998 by The American Society of Mechanical Engineers
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