Controlling the Dimensions of Laser Chemical Vapor Deposited Metallurgy

[+] Author and Article Information
L. Economikos, D. E. Kotecki, R. Surprenant

IBM Microelectronics Division, 1580 Rt. 52, Hopewell Jct., NY 12533

J. Electron. Packag 118(1), 7-10 (Mar 01, 1996) (4 pages) doi:10.1115/1.2792126 History: Received March 07, 1994; Revised November 06, 1995; Online November 06, 2007


The application of pyrolytic laser chemical vapor deposition (LCVD) to repair defects on multichip modules with a high circuit density requires tight control of the dimensions of the deposited metal. It is shown that by creating micro-channels into the substrate on both sides along the laser scan path, shorting to adjacent lines is eliminated and better control of deposited metal is achieved. A finite element model shows how the presence of the micro-channels reduces the temperature in the deposited material in the direction perpendicular to the laser scan, causing the deposition process to self-limit in this direction.

Copyright © 1996 by The American Society of Mechanical Engineers
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